ACM Research, Inc.

ACM Research, Inc., along with its affiliated companies, is a global developer, manufacturer, and provider of specialized single-wafer wet cleaning systems. These crucial systems are designed to enhance manufacturing processes and improve the yield of integrated circuits across the globe. The company's innovative technological offerings include: Space Alternated Phase Shift (SAPS) technology: This system uniformly applies megasonic energy at a microscopic scale to both flat and patterned wafer surfaces by utilizing alternating phases of megasonic waves. Timely Energized Bubble Oscillation (TEBO) technology: Specifically engineered for patterned wafer surfaces at advanced process nodes, this technology precisely cleans intricate 2D and 3D patterned wafers. Tahoe technology: Providing superior cleaning performance, this solution significantly reduces the consumption of sulfuric acid and hydrogen peroxide. Electro-chemical plating technology: This offering facilitates advanced metal plating processes. ACM Research markets and sells its product line, branded as Ultra C, through a combination of its own direct sales force and independent third-party representatives. Established in 1998, ACM Research, Inc. is headquartered in Fremont, California.

業界

Semiconductors

セクター

Technology

本社

US

最高経営責任者（CEO）

David H. Wang

上場以来

2017年11月2日

従業員

2,513

ACM Research, Inc., along with its affiliated companies, is a global developer, manufacturer, and provider of specialized single-wafer wet cleaning systems. These crucial systems are designed to enhance manufacturing processes and improve the yield of integrated circuits across the globe. The company's innovative technological offerings include: Space Alternated Phase Shift (SAPS) technology: This system uniformly applies megasonic energy at a microscopic scale to both flat and patterned wafer surfaces by utilizing alternating phases of megasonic waves. Timely Energized Bubble Oscillation (TEBO) technology: Specifically engineered for patterned wafer surfaces at advanced process nodes, this technology precisely cleans intricate 2D and 3D patterned wafers. Tahoe technology: Providing superior cleaning performance, this solution significantly reduces the consumption of sulfuric acid and hydrogen peroxide. Electro-chemical plating technology: This offering facilitates advanced metal plating processes. ACM Research markets and sells its product line, branded as Ultra C, through a combination of its own direct sales force and independent third-party representatives. Established in 1998, ACM Research, Inc. is headquartered in Fremont, California.

業界

Semiconductors

セクター

Technology

本社

US

最高経営責任者（CEO）

David H. Wang

上場以来

2017年11月2日

従業員

2,513